دراسة تاثير تقنيات التلدين (OTA) وغاز Ar على الخصائص الفيزيائيه لغشاء الرقيق ZnO محضر بواسطة PLD == Studying The Effects of OTA and Ar Gas Annealing Techniques on The Physical Properties of ZnO Thin Film Prepared by PLD
Author name:
ضحى شاكر حسن
Supervisor name:
مهدي قاسم زاير
General topic:
Physics
Specific topic:
Laser Physics and Electro-optics
Degree:
Master
University:
University of Technology
Language:
English
University location:
Baghdad
Key words:
- Pulsed Laser Deposition (PLD), ZnO thin film, Oil Thermal annealing (OTA), Ar Gas annealing
First pages:
T82018 - p.pdf
